Lithography Aware Regular Cell Design Based on a Predictive Technology Model

As semiconductor technology advances into the nanoscale era, optical effects such as channel narrowing, corner rounding or line-end pullback are critical to accomplish circuit yield specifications. It is well-demonstrated that layout regularity reduces the increasing impact of process variations on circuit performance and reliability. The purpose of this paper is to present the layout design of a regular cell based on 1-D elements which reduces lithography perturbations (ALARC). We depict several undesirable lithography effects and how these effects determine several layout parameters in order to achieve the required line-pattern resolution.